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SiO2 in Si Microdevices (Springer Series in Materials Science)
 
 
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SiO2 in Si Microdevices (Springer Series in Materials Science) (ハードカバー)

by Manabu Itsumi (著)
4.0 out of 5 stars  See all reviews (1 customer review)
Price: ￥ 15,409 (Tax Included) & eligible for Free Shipping. Details
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内容説明

Electronic systems and digital computers are an indispensable element of modern multimedia technologies and the Internet society. But their explosive advance would not have been possible without the extraordinary progress in VLSI technology using high-quality SiO2. This volume addresses the thin gate oxides involved in the individual processes in fabrication, e.g. the growth, cleaning and thermal oxidation of silicon, metal interconnect formation, and photolithography. It describes new methods for observing defects in SiO2 as well as novel approaches to eliminating such defects. The book will be a valuable resource for all materials scientists and engineers seeking to further advance the quality of silicon microdevices.


Book Description

Electronic systems and digital computers are an indispensable element of modern multimedia technologies and the Internet society. But their explosive advance would not have been possible without the extraordinary progress in VLSI technology using high-quality SiO2. This volume addresses the thin gate oxides involved in the individual processes in fabrication, e.g. the growth, cleaning and thermal oxidation of silicon, metal interconnect formation, and photolithography. It describes new methods for observing defects in SiO2 as well as novel approaches to eliminating such defects. The book will be a valuable resource for all materials scientists and engineers seeking to further advance the quality of silicon microdevices.

Product Details

  • ハードカバー: 334 pages
  • Publisher: Springer; 1 edition (2003/1/17)
  • Language: 英語, 英語, 英語
  • ISBN-10: 3540433392
  • ISBN-13: 978-3540433392
  • Release Date: 2003/1/17
  • Product Dimensions: 9.3 x 6 x 0.9 inches
  • Average Customer Review: 4.0 out of 5 stars  See all reviews (1 customer review)
  • Amazon.co.jp Sales Rank: #46,026 in 洋書 (See Bestsellers in 洋書)

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Front Cover | Copyright | Table of Contents | Excerpt | Index | Back Cover
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4.0 out of 5 stars 各プロセスが酸化膜に与える影響, 2009/8/30
By t-tatsumi (宮城県仙台市) - See all my reviews
　Si基板、洗浄、ポリシリコン形成、ゲート形成後のプラズマプロセス等の各製造プロセスがゲート酸化膜に与える影響について丁寧にまとめられています。但し、シリコン酸化膜の形成方法や物性に関しては詳しくありません。章毎に各プロセス（とゲート酸化膜との関連）が解説されており、その解説は豊富なデータと必ずモデルを示すという手法が終始用いられています。酸化膜と酸化膜形成以外のプロセスとの関連の多さから、最適な酸化膜を得るためには、様々なプロセスを改善しなければならないことを改めて認識させられました。良書ですが、一つ残念なのは、掲載されているSEM写真が印刷不良のために見づらいものが幾つかあることです。
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